NANOSTRUCTURED MoS2 WITH ATOMICALLY SHARP EDGES
TABLE OF TECHNICAL SPECIFICATIONS
- Hole diameter = 100 nm
- Pitch = 200 nm
- MoS2 thickness = 10-100 nm
(specified by customer)
- Flake size approximately 100x100 microns
- Substrate = thermally oxidized silicon
MoS2 belongs to a class of layered van der Waals materials known as transition metal dichalcogenides (TMDs). Monolayer MoS2 is the first known monolayer TMD that has prooven to have unique optical and electronic properties, thanks to its large exciton binding energy and direct bandgap.
Our company offers a special type of nanostructured MoS2 with atomically sharp edges and exclusive zigzag terminations. Zigzag edges are metallic and ferromagnetic, which makes them very different from semiconducting MoS2 planes. Such zigzag edges are also known for their high catalytic activity in e.g. hydrogen evolution reaction. These unique properties make nanostructured MoS2 attractive for multiple applications, ranging from structural colors, nanophotonics and optoelectronics to mechanical filters and catalysis.
Our samples are obtained using a patented AtomicEdge technology, which combines reactive ion etching with subsequent anisotropic etching. This allows to produce highly ordered nanostructures of predefined complexity with atomically sharp edges and over areas limited only by the initial MoS2 flake size (which can be up to a few millimeters).
The excitonic properties of MoS2 remain as in the unpatterned material just a few nanometers away from the edge. The nanostructured pattern is predefined by the electron beam lithography file, which can be both made by us or provided by a customer.
The nanostructured pattern is predefined by the electron beam lithography file, which can be both made by us or provided by a customer. Contact us to discuss the price of our service.